- Qingqingquan
- Shandong
- 20 days
- 300 units per month
1 m³/h ultra-pure water systems producing 18.2 MΩ·cm water. Meets ASTM and ISO standards, 99.999% impurity removal, automated operation. Download technical specifications.
18.2 MΩ·cm Water Purification for Semiconductor Industry
Why 18.2 MΩ·cm Water is Critical for High-Tech Industries
✔ Produces laboratory-grade water - Meets ASTM D1193 and ISO 3696 standards
✔ Removes 99.999% impurities - Eliminates ions, organics, and particles
✔ Ensures process reliability - Prevents product defects in sensitive applications
✔ Reduces operational costs - 60% lower than purchasing bottled ultra-pure water
Industry Fact: Semiconductor manufacturing requires ultra-pure water with TOC <5 ppb and resistivity >18 MΩ·cm
Technical Specifications
| Parameter | Specification |
|---|---|
| Capacity | 1 m³/hour (1000 L/h) |
| Final Resistivity | 18.2 MΩ·cm @25°C |
| TOC Level | <20 ppb |
| Bacteria Count | <1 CFU/100ml |
| Particle Size | <0.22 μm |
4-Stage Purification Process
1. Pretreatment System
• Multi-media filtration - Removes particles >5μm
• Activated carbon adsorption - Eliminates chlorine and organics
• Water softening - Prevents scale formation
• Precision filtration - 1μm final pre-filter protection
2. Reverse Osmosis Unit
• High-rejection RO membranes - 99% salt rejection rate
• Automatic flush system - Membrane protection during shutdown
• Continuous monitoring - Real-time TDS and pressure measurement
3. Mixed Bed Ion Exchange
• Nuclear-grade resins - High capacity cation/anion exchange
• 1:2 ratio configuration - Optimal resin mixture for maximum purity
• In-situ regeneration - Minimal downtime for maintenance
4. Final Polishing
• UV oxidation - 185nm wavelength for TOC reduction
• Ultrafiltration - 0.22μm absolute particle removal
• Point-of-use filtration - Maintains purity at delivery point
Performance Data
| Contaminant | Feed Water | Product Water | Removal Rate |
|---|---|---|---|
| Resistivity | 1000 Ω·cm | 18.2 MΩ·cm | 99.999% |
| Total Ions | 500 ppm | <1 ppb | 99.9998% |
| Silica | 20 ppm | <0.1 ppb | 99.9995% |
| TOC | 3.0 ppm | <5 ppb | 99.8% |
5 Competitive Advantages
✔ Continuous monitoring - Real-time resistivity and TOC measurement
✔ Automated regeneration - Minimal operator intervention required
✔ Compact design - 30% smaller footprint than conventional systems
✔ Energy efficient - Low power consumption with smart controls
✔ Warranty - Comprehensive coverage on membranes and resins
Case Study: Electronics manufacturer reduced product rejection rate by 45% after installation
Industrial Applications
1. Semiconductor Manufacturing
• Wafer cleaning and rinsing
• Chip fabrication processes
• Ultra-pure chemical dilution
2. Pharmaceutical Production
• Water for injection (WFI)
• Laboratory reagent preparation
• Medical device manufacturing
3. Biotechnology
• Cell culture media preparation
• DNA sequencing applications
• Laboratory equipment cleaning
4. Analytical Laboratories
• HPLC and LC-MS mobile phases
• Atomic absorption spectroscopy
• Trace element analysis
Economic Analysis
| Cost Factor | Purchased UPW | On-site Generation | Savings |
|---|---|---|---|
| Annual Water Cost | $120,000 | $35,000 | 71% |
| Quality Assurance | $15,000 | $5,000 | 67% |
| Logistics | $8,000 | $0 | 100% |
| Total Annual | $143,000 | $40,000 | 72% |
Maintenance Protocol
✅ Daily: Resistivity and TOC verification
✅ Weekly: Sanitization and resin performance check
✅ Monthly: Full system calibration and validation
✅ Quarterly: Membrane cleaning and component replacement
✅ Annually: Complete system revalidation and certification
Pro Tip: Maintain feed water temperature at 25±2°C for optimal resistivity measurement accuracy
Why Choose Our Ultra-Pure Systems?
✔ 20 years specialty water experience - 2000+ successful installations
✔ Full compliance - Meets ASTM, ISO, and SEMI standards
✔ 24/7 technical support
✔ Validation support - Complete IQ/OQ/PQ documentation package
