• Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants
  • Qingqingquan
  • Shandong
  • 20 days
  • 300 units per month

Semiconductor ultra pure water systems delivering 18 MΩ.cm quality. Advanced RO+EDI+polishing technology for wafer fabrication and chip manufacturing. SEMI standards compliant solutions.

Semiconductor Ultra Pure Water Systems | 18 MΩ.cm EDI & RO Water Plants



Intro: Meet semiconductor manufacturing standards with our ultra pure water systems. Achieve consistent 18 MΩ.cm water quality using advanced RO+EDI+polishing mixed bed technology. Certified solutions for wafer production and chip manufacturing.




Why Ultra Pure Water Matters in Semiconductor Manufacturing

Ultra pure water (UPW) is the lifeblood of semiconductor fabrication facilities. Even minute impurities can cause:


Critical Risks of Impure Water:

  • Circuit Defects: Particle contamination on wafers
  • Yield Reduction: Decreased production efficiency
  • Equipment Damage: Scaling and corrosion in sensitive tools
  • Product Failure: Ionic contamination affecting chip performance


Water Quality Standards:

  • Resistivity: ≥18 MΩ.cm at 25°C
  • Particle Count: <5 particles/ml (>0.1μm)
  • TOC Level: <1 ppb
  • Silica Content: <0.5 ppb



Semiconductor Ultra Pure Water System

5 Advanced Process Configurations

1. Traditional RO + Mixed Bed System

  • Process Flow: Pretreatment → RO → Mixed Bed → Polishing → UV → Filtration
  • Final Quality: ≥18 MΩ.cm
  • Best For: High-purity requirements with chemical regeneration
  • Key Features: Proven reliability, chemical regeneration


2. Advanced RO + EDI Technology

  • Process Flow: Pretreatment → RO → EDI → Polishing → UV → 0.2μm Filtration
  • Final Quality: ≥18 MΩ.cm
  • Best For: Continuous chemical-free operation
  • Key Features: No chemicals, continuous production


3. Double Pass RO + EDI System

  • Process Flow: Pretreatment → Primary RO → Secondary RO → EDI → UV → 0.2μm Filtration
  • Final Quality: ≥17 MΩ.cm
  • Best For: High-recovery applications
  • Key Features: Positively charged RO membranes, pH adjustment


4. Compact EDI System

  • Process Flow: Pretreatment → RO → EDI → UV → 0.2μm Filtration
  • Final Quality: ≥15 MΩ.cm
  • Best For: Space-constrained facilities
  • Key Features: Compact design, lower capital cost


5. Hybrid Mixed Bed System

  • Process Flow: Pretreatment → RO → Mixed Bed → UV → Filtration
  • Final Quality: ≥15 MΩ.cm
  • Best For: Budget-conscious projects
  • Key Features: Cost-effective, reliable performance



EDI RO Water Plant

Technical Specifications


ParameterSpecification
Output Quality15-18 MΩ.cm
TOC Level<1 ppb
Particle Count<5 particles/ml (>0.1μm)
Silica Content<0.5 ppb
Bacteria Count<1 CFU/100ml
System Capacity1-100 m³/h




Core System Components

1. Advanced Pretreatment

  • Multi-media filtration
  • Activated carbon adsorption
  • Ultrafiltration systems
  • Chemical dosing control


2. Reverse Osmosis Systems

  • Double pass RO configuration
  • High-rejection membranes
  • Energy recovery devices
  • Automatic flushing systems


3. EDI Electrodeionization

  • Continuous demineralization
  • Chemical-free operation
  • Stable resistivity output
  • Low operating costs


4. Final Polishing

  • Mixed bed polishers
  • UV sterilization systems
  • Membrane filtration
  • Point-of-use filtration




Key System Advantages

1. Maximum Purity Assurance

  • Consistent 18 MΩ.cm output
  • Multiple purification barriers
  • Real-time quality monitoring
  • Automated control systems


2. Operational Efficiency

  • Continuous 24/7 operation
  • Low energy consumption
  • Minimal chemical usage
  • Reduced wastewater


3. Reliability & Safety

  • Redundant system design
  • Automatic fail-safe protection
  • Comprehensive monitoring
  • Certified components


4. Cost Effectiveness

  • Lower operating costs
  • Reduced maintenance
  • Long component lifespan
  • Energy recovery systems


5. Compliance & Certification

  • SEMI standards compliance
  • ISO 9001 certification
  • CE and UL certifications
  • Environmental compliance



Reverse Osmosis System Water Treatment Equipment Application

Industry Applications

Semiconductor Manufacturing:

  • Silicon wafer production
  • Chip fabrication facilities
  • Integrated circuit manufacturing
  • MEMS device production


Related Industries:

  • Flat panel display manufacturing
  • Solar cell production
  • LED chip fabrication
  • Microelectronics research




Selection Guide

Choosing the Right System:

For New Fabs:

  • RO + EDI + polishing mixed bed
  • Full automation capability
  • Expansion-ready design
  • Latest technology


For Existing Facilities:

  • System upgrade options
  • Retrofitting services
  • Capacity expansion
  • Technology migration


For Budget Projects:

  • Traditional mixed bed systems
  • Proven technology
  • Lower initial investment
  • Reliable performance




Service & Support

Professional Services:

  • Facility assessment
  • System design engineering
  • Installation supervision
  • Validation and commissioning


Technical Support:

  • 24/7 remote monitoring
  • Preventive maintenance
  • Spare parts supply
  • Performance optimization



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